Product Summary
Compact, Barrel Type, Low Temperature Ashing Device
Features
RF Power: Max. 500W
Space-saving design with oscillation section integrated with a portion of the chamber
Equipped with a large quartz chamber (φ215mm) which can process bigger testing samples
Outstanding operability and safety by the automatic tuning system equipped as a standard function
Specifications
Catalog
Optional Items
Same Series Product
Plasma Reactor (Barrel Chamber)(PR200)
Plasma Reactor (Barrel Chamber)(PR300)
Plasma Reactor (Barrel Chamber)(PR301)
Plasma Reactor (Barrel Chamber)(PR510)
Sign In
